| 摘要 |
<p>A substrate processing apparatus is provided. The substrate processing apparatus according to the present invention simplifies the installation and maintenance of a heater because the heater is inserted into a main body on the left surface, right surface, or rear surface of the main body, a terminal plate formed on the other end of the heater exposed to the outside of the main body is coupled to the main body, the heater is installed inside a case to expose the terminal plate to the outside the case when an external power source is connected to the terminal plate or the cover is separated, and then the external power source is connected to the terminal plate. And, the radiant heat emitted from the heater is reflected by a reflection plate. Therefore, the present invention can heat the substrate at high temperatures using a small amount of energy because the substrate is heated by the radiant heat emitted from the heater and the radiant heat reflected from the reflection plate.</p> |
