| 摘要 |
<p>A hybrid mask less exposure apparatus and a method for forming a pattern are provided to reduce the consumption amount of mater by forming a first pattern where it's needed. In a hybrid mask less exposure apparatus and a method for forming a pattern, a pattern printing part(100) prints a film having a first pattern on a target(300). A laser light irradiation unit(200) irradiates a laser so that a part of a film having the first pattern is removed and the film having the second pattern is formed. The laser light irradiation unit is composed of a light source, a spatial light modulator, and multi array lens. The spatial light modulator reflects the light from the light source to have the pattern.</p> |
