| 摘要 |
PROBLEM TO BE SOLVED: To provide a member for a film deposition apparatus excellent in mountability and generating little gas or residue at a desorption time even under a high temperature.SOLUTION: A member for a film deposition apparatus has a substrate material having a deposition-preventive surface and an elastomer layer of a silicon rubber or a fluorine-containing rubber on a surface on the opposite side to the deposition-preventive surface of the substrate material. The film deposition apparatus includes at least the member for the film deposition apparatus inside a film deposition vessel. Further, the adhesive strength of the elastomer layer surface is preferably 80 gw/cmor more and 1,500 gw/cmor less and the member for the film deposition apparatus is preferably a deposition-preventive plate for the film deposition apparatus. |
