| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNED CURED FILM, AND ELECTRONIC COMPONENT |
| 摘要 |
There is provided a photosensitive resin composition containing (A) an alkali-soluble resin, (B) a compound which generates an acid when exposed to light, (C) a thermal crosslinking agent, and (D) a nitrogen-containing aromatic compound represented by the following formula (1):;;wherein R1 represents a hydrogen atom or a hydrocarbon group; R2 represents a hydrogen atom, an amino group or a phenyl group; and A and B each independently represent a nitrogen atom, or a carbon atom and a hydrogen atom bonded thereto. |
| 申请公布号 |
US2014322635(A1) |
申请公布日期 |
2014.10.30 |
| 申请号 |
US201214364498 |
申请日期 |
2012.10.31 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
Tanimoto Akitoshi;Nobe Shigeru;Kasuya Kei;Matsutani Hiroshi;Katogi Shigeki;Aoki Yu;Tahara Shingo |
| 分类号 |
G03F7/075 |
主分类号 |
G03F7/075 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photosensitive resin composition, comprising:
(A) an alkali-soluble resin; (B) a compound which generates an acid when exposed to light; (C) a thermal crosslinking agent; and (D) a nitrogen-containing aromatic compound represented by the following formula (1):wherein R1 represents a hydrogen atom or a hydrocarbon group; R2 represents a hydrogen atom, an amino group or a phenyl group; and A and B each independently represent a nitrogen atom, or a carbon atom and a hydrogen atom bonded thereto. |
| 地址 |
Tokyo JP |
