METHODS FOR FABRICATION OF STABLE ULTRA-LOW REFLECTIVE SURFACE AND THE ULTRA-LOW REFLECTIVE SURFACE ITSELF

摘要

A method to prepare low reflective surface according to an example of the present invention comprises: the first step to prepare materials having pillar structure on the surface; the second step to prepare aluminum surface-materials by treating for the pillar structure to have aluminum surface; and the third step to prepare a low reflective surface with dual protuberance structure by forming nano-flake layer on the pillar surface of the material surface through oxidation of the surface aluminum of the aluminum surface-materials. The method to prepare low reflective surface can provide a low reflective surface structure that can be applied to photovoltaic device surface or various display surface as a surface able to reduce reflection significantly by absorbing wavelengths in the range of visible and infrared ray through internally total reflection with simple, low cost, and ecofriendly process.

主权项

1. A method for fabrication of ultra-low reflective surface structure, comprising:
a first step to prepare a material containing a pillar structure on a surface thereof; a second step to prepare an aluminum surface-material by forming aluminum layer on the pillar structure of the material; and a third step to prepare ultra-low reflective surface with a dual protuberance structure by oxidizing aluminum on the aluminum surface-material to form a nano flake layer onto the pillar structure of the surface; wherein the nano flake layer comprises needle-like or plate-like nano flakes formed onto the pillar structure of the surface.