Flourine and HF Resistant Seals for an Ion Source

摘要

An exemplary ion source for creating a stream of ions has a chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. Electrically insulating seal element(s) engaging an outer surface of the arc chamber body are provided for impeding material from exiting the chamber interior openings of the arc chamber body. The seal element(s) have a ceramic body that includes an outer wall that abuts the arc chamber body along a circumferential outer lip. The seal also has one or more radially inner channels bounded by one or more inner walls spaced inwardly from the outer wall. The electrically insulating seal element comprises a Boron Nitride (BN) material.

主权项

1. An ion source for use in an ion implantation system, comprising:
an arc chamber body having a chamber interior bound by chamber walls providing a confined region for generating ions from a source gas within the confined region and having an exit through which ions exit the arc chamber body, said arc chamber body including at least one access opening passing through a wall of the chamber body for routing ion source components from outside the arc chamber to the chamber interior; a cathode situated in the at least one access opening and supported in relation to the chamber interior for injecting ionizing electrons into the confined region of said arc chamber for ionizing the source gas therein when energized; and at least one electrically insulating seal element engaging an outer surface of the arc chamber body for impeding material from exiting the chamber interior through the at least one access opening of the arc chamber body; wherein said at least one electrically insulating seal element comprises Boron Nitride (BN) material.