| 主权项 |
1. A positive resist composition comprising:
(A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid, wherein the resin (A) has no fluorine atom, wherein the resin (A) does not have an aromatic group; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound, wherein the fluorine-containing compound (C) is a resin, containing at least one group selected from the groups (x) to (z):
(x) an alkali-soluble group;(y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and(z) a group which decomposes by an action of an acid; and (F) a solvent, wherein: the amount of the fluorine-containing compound (C) added is from 0.1 to 30% by mass based on all solid components of the positive resist composition; the fluorine-containing compound (C) has a structure represented by formula (F3) and the compound (C) is a compound containing a branched alkyl group substituted by at least one fluorine atom: wherein R62 and R63 each independently represents a fluoroalkyl group, provided that R62 and R63 may be bonded to each other to form a ring; and R64 represents a hydrogen atom, a fluorine atom or an alkyl group; and the amount of the resin (A) added to the positive resist composition is 50 to 99.7% by mass based on all solid components of the positive resist composition. |
