发明名称 Method of forming pattern, reticle, and computer readable medium for storing program for forming pattern
摘要 A method of forming a pattern includes forming a plurality of target patterns, forming a plurality of pitch violating patterns that make contact with the plurality of target patterns and are disposed between the plurality of target patterns, classifying the plurality of pitch violating patterns into a first region and a second region adjacent to the first region, and forming an initial pattern corresponding to one of the first region and the second region.
申请公布号 US8871104(B2) 申请公布日期 2014.10.28
申请号 US201113221606 申请日期 2011.08.30
申请人 Samsung Electronics Co., Ltd. 发明人 Park Dong-woon;Lee Hyun-jong;Choi Si-young;Bae Yong-kug
分类号 G06F17/50;H01L21/027;H01L21/033;G03F1/70 主分类号 G06F17/50
代理机构 F. Chau & Associates, LLC 代理人 F. Chau & Associates, LLC
主权项 1. A method of forming a pattern, comprising: forming a plurality of target patterns; forming a plurality of pitch violating patterns, separate from the plurality of target patterns, that make contact with each of adjacent target patterns from among the plurality of target patterns, are disposed between the plurality of target patterns, and are spaced apart from one another; classifying the plurality of pitch violating patterns into a first region and a second region adjacent to the first region; fabricating an integrated circuit having an initial pattern corresponding to one of the first region and the second region; forming a side wall that surrounds the initial pattern, wherein the side wall includes a first portion that overlaps the plurality of target patterns and a second portion that does not overlap the plurality of target patterns; and forming a trimming pattern corresponding to the second portion of the side wall.
地址 Suwon-Si, Gyeonggi-Do KR