发明名称 Automating integrated circuit device library generation in model based metrology
摘要 Various embodiments include computer-implemented methods, computer program products and systems for generating an integrated circuit (IC) library for use in a scatterometry analysis. In some cases, approaches include: obtaining chip design data about at least one IC chip; obtaining user input data about the at least one IC chip; and running an IC library defining program using the chip design data in its original format and the user input data in its original format, the running of the IC library defining program including: determining a process variation for the at least one IC chip based upon the chip design data and the user input data; converting the process variation into shape variation data; and providing the shape variation data in a text format to a scatterometry modeling program for use in the scatterometry analysis.
申请公布号 US8869081(B2) 申请公布日期 2014.10.21
申请号 US201313741645 申请日期 2013.01.15
申请人 International Business Machines Corporation;Global Foundries, Inc. 发明人 Saleh Nedal;Vaid Alok
分类号 G06F17/50 主分类号 G06F17/50
代理机构 Hoffman Warnick LLC 代理人 Cai Yuanmin;Hoffman Warnick LLC
主权项 1. A computer-implemented method of generating an integrated circuit (IC) library for use in a scatterometry analysis performed on at least one computing device, the method comprising: obtaining chip design data about at least one IC chip; obtaining user input data about the at least one IC chip, wherein the user input data includes a film stack file; and running an IC library defining program using the chip design data in its original format and the user input data in its original format using the at least one computing device, the running of the IC library defining program including: determining a process variation for the at least one IC chip based upon the chip design data and the user input data;converting the process variation into shape variation data; andproviding the shape variation data in a text format for use by a scatterometry modeling program in the scatterometry analysis; reading the shape variation data in the text format after the providing of the shape variation data in the text format to the scatterometry modeling program;running a parameter setting optimization process on the shape variation data to generate the IC library;attaching an initial library performance header to the IC library,wherein the initial library performance header includes a text file that carries performance metrics dictating when an optimization iteration terminates;installing the IC library on a scatterometry tool;measuring an IC wafer using the scatterometry tool having the installed IC library; andupdating the initial library performance header based upon the measurements of the IC wafer to form an updated library performance header.
地址 Armonk NY US