| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a regular pattern with reduced variation by utilizing a self-organizing micro phase separation structure.SOLUTION: A method of forming a regular pattern includes a step of forming, on a substrate, a bond with a first bonding group of a first hydrophilic homopolymer and a second bonding group of a second hydrophobic homopolymer which is cleavable with acid, base, light or heat to form a block copolymer consisting of the first homopolymer and the second homopolymer bonded together, a step of causing the formed block copolymer by a heat treatment to undergo micro phase separation so as to arrange alternately the hydrophilic region containing the first homopolymer and the hydrophobic region containing the second homopolymer and a step of cleaving the bond between the first homopolymer and the second homopolymer selectively by acid, base, light or heat. |
