CANISTER FOR DEPOSITION APPARATUS, AND DEPOSITION APPARATUS AND METHOD USING THE SAME

摘要

A deposition apparatus, and a canister for the deposition apparatus capable of maintaining a predetermined amount of source material contained in a reactive gas supplied to a deposition chamber when the source material is deposited on a substrate by atomic layer deposition includes a main body, a source storage configured to store a source material, a heater disposed outside the main body, and a first feed controller configured to control the source material supplied to the main body from the source storage.

主权项

1. A deposition method, comprising:
opening a first valve interposed between a main body and a source storage of a canister, and supplying a predetermined amount of source material to the main body; closing the first valve after supplying the predetermined amount of the source material and evaporating the supplied source material in the main body; supplying a carrier gas to the main body to be mixed with the evaporated source material; supplying a reactive gas formed by mixing the carrier gas with the evaporated source material from the main body to a deposition chamber; and depositing the source material contained in the reactive gas on a substrate in the deposition chamber.