发明名称 Method and apparatus for measuring overlay
摘要 A method of measuring an overlay includes generating an original signal using first and second overlay measurement keys that are spaced apart from each other, generating a first spectrum signal by performing Fourier transform of the original signal, generating a second spectrum signal by filtering the first spectrum signal, and generating a corrected signal by performing inverse Fourier transform of the second spectrum signal.
申请公布号 US8860953(B2) 申请公布日期 2014.10.14
申请号 US201213349770 申请日期 2012.01.13
申请人 Samsung Electronics Co., Ltd. 发明人 Shim Seong-Bo;Yeo Jeong-Ho;Kim Ho-Yeon
分类号 G01B11/00;G01B11/14;G03F7/20 主分类号 G01B11/00
代理机构 Lee & Morse P.C. 代理人 Lee & Morse P.C.
主权项 1. A method of measuring an overlay, comprising: generating an original signal using first and second overlay measurement keys which are spaced apart from each other; generating a first spectrum signal by performing Fourier transform of the original signal; generating a second spectrum signal by filtering the first spectrum signal; and generating a corrected signal by performing inverse Fourier transform of the second spectrum signal; wherein performing the Fourier transform of the original signal includes making the original signal pass through a Fourier transform lens set; and wherein the first spectrum signal is formed in a spectrum domain that includes a first axis and a second axis, which has an optical axis of the Fourier transform lens set as an original point, the first spectrum signal includes a plurality of dot signals, and a pitch of the first spectrum signal in a second-axis direction is wider than a pitch in a first-axis direction.
地址 Suwon-si, Gyeonggi-do KR