发明名称 |
Method and apparatus for measuring overlay |
摘要 |
A method of measuring an overlay includes generating an original signal using first and second overlay measurement keys that are spaced apart from each other, generating a first spectrum signal by performing Fourier transform of the original signal, generating a second spectrum signal by filtering the first spectrum signal, and generating a corrected signal by performing inverse Fourier transform of the second spectrum signal. |
申请公布号 |
US8860953(B2) |
申请公布日期 |
2014.10.14 |
申请号 |
US201213349770 |
申请日期 |
2012.01.13 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Shim Seong-Bo;Yeo Jeong-Ho;Kim Ho-Yeon |
分类号 |
G01B11/00;G01B11/14;G03F7/20 |
主分类号 |
G01B11/00 |
代理机构 |
Lee & Morse P.C. |
代理人 |
Lee & Morse P.C. |
主权项 |
1. A method of measuring an overlay, comprising:
generating an original signal using first and second overlay measurement keys which are spaced apart from each other; generating a first spectrum signal by performing Fourier transform of the original signal; generating a second spectrum signal by filtering the first spectrum signal; and generating a corrected signal by performing inverse Fourier transform of the second spectrum signal; wherein performing the Fourier transform of the original signal includes making the original signal pass through a Fourier transform lens set; and wherein the first spectrum signal is formed in a spectrum domain that includes a first axis and a second axis, which has an optical axis of the Fourier transform lens set as an original point, the first spectrum signal includes a plurality of dot signals, and a pitch of the first spectrum signal in a second-axis direction is wider than a pitch in a first-axis direction. |
地址 |
Suwon-si, Gyeonggi-do KR |