发明名称 |
IMPROVEMENT OF BARRIER FILM PERFORMANCE WITH N2O DILUTION PROCESS FOR THIN FILM ENCAPSULATION |
摘要 |
<p>A method and apparatus for depositing an inorganic layer onto a substrate is described. The inorganic layer may be part of an encapsulating film utilized in various display applications. The encapsulating film includes one or more inorganic layers as barrier layers to improve water-barrier performance. An oxygen containing gas, such as nitrous oxide, is introduced during the deposition of the inorganic layer. As a result, the inorganic layer is lower in stress and may obtain a water vapor transmission rate (WVTR) of less than 100 mg/m2-day.</p> |
申请公布号 |
WO2014164465(A1) |
申请公布日期 |
2014.10.09 |
申请号 |
WO2014US22498 |
申请日期 |
2014.03.10 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHOI, YOUNG JIN;PARK, BEOM SOO;CHOI, SOO YOUNG |
分类号 |
H01L51/52;H01L21/205 |
主分类号 |
H01L51/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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