| 摘要 |
Provided is a resist composition for forming a resist pattern having decreased roughness. For this, a resist composition is characterized by comprising a polymer compound having a constituting unit derived from an acrylic aid ester, in which a hydrogen atom combined with a carbon atom at an α position may be substituted with a substituent, the constituting unit having a lactone-containing cyclic group having an electron withdrawing group at the terminal of a side chain, and an acid generator composed of a compound represented by general formula (b1). In general formula (b1), R^101 is a cyclic group, an alkyl group of a chain type or an alkenyl group of a chain type that may have a substituent. q″ is an integer of 1-20. M^m^+ is an organic cation having m valency. [Chemical formula 1]. |
