发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF INTERLAYER INSULATING FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC ELECTROLUMINESCENCE (EL) DISPLAY DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a production method of an interlayer insulating film capable of further improving resolution power.SOLUTION: The production method of an interlayer insulating film includes steps of: (1) applying a photosensitive resin composition on a substrate; (2) removing a solvent from the applied photosensitive resin composition; (3) exposing the photosensitive resin composition from which the solvent is removed to actinic rays; (4) developing the exposed photosensitive resin composition by using a developer essentially comprising a solvent; and (5) baking the developed photosensitive resin composition to thermally cure the composition. The photosensitive resin composition comprises: (A) a polymer having (a1) a structural unit having an acid group and (a2) a structural unit having a crosslinking group; (B) a quinonediazide compound; and (C) a solvent. The (a2) structural unit having a crosslinking group contains a structural unit including at least one group selected from the group consisting of an epoxy group, an oxetanyl group, and a group expressed by -NH-CH-O-R (where R represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms).</p> |
申请公布号 |
JP2014191298(A) |
申请公布日期 |
2014.10.06 |
申请号 |
JP20130068903 |
申请日期 |
2013.03.28 |
申请人 |
FUJIFILM CORP |
发明人 |
YONEZAWA HIROYUKI |
分类号 |
G03F7/023;G03F7/40;H01L21/027 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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