摘要 |
<p>PROBLEM TO BE SOLVED: To provide an artificial quartz substrate for a semiconductor package cover having an extremely smallα-ray release amount by using only an artificial quartz raised and refined once or more as a raw material for raising the artificial quartz.SOLUTION: In a method for producing an artificial quartz substrate for a semiconductor package cover by a hydrothermal synthesis method, a semiconductor package cover is produced by using only an artificial quartz raised and refined at least once or more as a raw material quartz used for raising the artificial quartz, to thereby suppress theα-ray release amount from the semiconductor package cover below a specified value. An artificial quartz substrate for a semiconductor package cover produced by this production method is also provided.</p> |