LASER ANNEALING DEVICE

摘要

This laser annealing device may be provided with: a laser source unit for emitting a pulsed laser beam to be irradiated on a thin film formed on a material to be processed; a pulse-width-varying unit for varying a pulse width of the pulsed laser beam; a molten-state-measurement unit for detecting a molten state of the thin film on which the pulsed laser beam is irradiated; and a control unit for calculating a duration of the molten state of the thin film on the basis of the result of detection by the molten-state-measurement unit, and controlling the pulse-width-varying unit so that the duration of the molten state is of a prescribed length.