| 摘要 |
PURPOSE: A coating and developing apparatus, a coating and developing method, and a storage medium are provided to improve a throughput by preventing a substrate entering space to a rear module of a heating module from increasing. CONSTITUTION: A MUTC is produced from a MUT of each module(S2). An AST about a transfer arm to transfer a wafer to a heating module is produced(S4). A cycle time of the transfer arm to access PAB is determined by comparing the AST with maximum MUTC(S5). A wafer stay cycle in the PAB is produced as an integral number by rounding off a fraction if the fraction occurs(S6). A wafer stay cycle in a PEB is produced as an integral number by rounding off a fraction if the fraction occurs(S7). A transfer schedule is set based on the number of the wafer stay cycles in the PAB and the PEB, the number of cycles to change a temperature in the PAB and the PEB, and the cycle time of the transfer arm(S8). |
