PROCEDIMIENTO DE DEPOSICION DE NANOPARTICULAS METALICAS POR DEPOSICION FISICA EN FASE DE VAPOR Y PROCEDIMIENTO DE GENERACION DE RUGOSIDADES.

摘要

The invention relates to a method for depositing metal nanoparticles on any type of substrate by means of cathode sputtering, in which the deposition is performed at a power density of between 0.2-5 W/cm2 at a pressure between 60 and 180 Pa, in the presence of a noble gas. Using the method of the invention, it is possible to deposit nanoparticles on any type of substrate (polymers, fibres, silicon, etc.) at low temperatures, in particular ambient temperatures, without deposition area limits and without deposition time restrictions. Following the deposition, by inverting the polarity, it is possible to produce areas of roughness on a nanometric scale on the substrate.