| 摘要 |
PURPOSE: A composition for forming a silica layer is provided to remarkably reduce defects and form a silica layer with improved insulation and gap-fill properties. CONSTITUTION: A composition for forming a silica layer comprises one selected from hydrogenated polysilazane, hydrogenated polysiloxazane, and combinations thereof. The concentration of the hydrogenated polysilazane and hydrogenated polysiloxazane more than an average molecular weight of polystyrene of 50,000 is 0.1% or less. The number of particulates of the composition in the solution is 0-100 /cc. The weight average molecular weight of the hydrogenated polysilazane and hydrogenated polysiloxazane is 1,000-10,000. The total contents of the hydrogenated polysilazane and the hydrogenated polysiloxazane is 0.1-50 weight%. |
