| 发明名称 |
PATTERN FORMING METHOD AND MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM |
| 摘要 |
According to exemplary embodiments, a pattern forming method includes: forming a diblock copolymer coating film by applying coating liquid containing a diblock copolymer including a chain of a first polymer and a chain of a second polymer which is not compatible with the first polymer, and a homopolymer having affinity with the first polymer, on a substrate, and drying the liquid; and performing phase separation of the first polymer and the second polymer by providing a coating film for solvent annealing using a solvent having compatibility with the second polymer. |
| 申请公布号 |
US2014287266(A1) |
申请公布日期 |
2014.09.25 |
| 申请号 |
US201314017217 |
申请日期 |
2013.09.03 |
| 申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
WATANABE Akira;TAKIZAWA Kazutaka;KIMURA Kaori |
| 分类号 |
G11B5/84;G11B5/74 |
主分类号 |
G11B5/84 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A pattern forming method comprising:
forming a diblock copolymer coating film by applying coating liquid containing a diblock copolymer including a chain of a first polymer and a chain of a second polymer which is not compatible with the first polymer, and a homopolymer having affinity with the first polymer, on a substrate, and drying the liquid; performing phase separation of the first polymer and the second polymer by solvent annealing the diblock copolymer film using a solvent having compatibility with the second polymer; and forming a pattern on the substrate by removing one of the first polymer and the second polymer from the film. |
| 地址 |
Tokyo JP |
