发明名称 SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 According to one embodiment, a method for manufacturing a semiconductor light-emitting device includes growing a semiconductor film including a group III nitride semiconductor on a silicon substrate, dividing the grown semiconductor film into a plurality of sections by selectively removing the semiconductor film, forming an aluminum film to cover the semiconductor film, removing the aluminum film selectively, oxidizing the remained aluminum film, and removing the silicon substrate.
申请公布号 US2014284611(A1) 申请公布日期 2014.09.25
申请号 US201314017233 申请日期 2013.09.03
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 AKIYAMA Kazuhiro;ITONAGA Shuji
分类号 H01L33/32 主分类号 H01L33/32
代理机构 代理人
主权项 1. A method of manufacturing a semiconductor light-emitting device, the method comprising: growing a semiconductor film including a group III nitride semiconductor on a silicon substrate; dividing the semiconductor film into a plurality of sections by pattern removal of portions of the semiconductor film; forming an aluminum film to cover the semiconductor film; selectively removing portions of the aluminum film to form opening where the semiconductor film is exposed; oxidizing the remaining aluminum film; forming an electrode in the opening and on the upper face of the semiconductor film; and removing the silicon substrate by etching.
地址 Tokyo JP