发明名称 |
PRODUCTION METHOD OF NITRIDE SEMICONDUCTOR CRYSTAL OF GROUP 13 METAL IN PERIODIC TABLE, AND PRODUCTION APPARATUS USED THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a high-quality nitride semiconductor crystal of a group 13 metal in the periodic table having a small film thickness distribution by a vapor growth method.SOLUTION: When growing a nitride semiconductor crystal of a group 13 metal in the periodic table in a reaction vessel by using a principal surface 10 of a ground substrate 9 as a growth surface, in the growth surface of the ground substrate 9, the area ratio of a region 11 included in a projection locus 6 when a supply port 2 of a nozzle 1 for supplying gas containing a raw material of a group 13 metal in the periodic table is projected toward its supply direction is set to be 50% or more. |
申请公布号 |
JP2014177374(A) |
申请公布日期 |
2014.09.25 |
申请号 |
JP20130052185 |
申请日期 |
2013.03.14 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
FUKUYAMA HISASHI;GODA MASAKI;MITANI HIROSHI;SUZUKI YOSHINORI;SAITO TAKEYA |
分类号 |
C30B29/38;C23C16/34;C23C16/455;C30B25/14;H01L21/205 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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