| 发明名称 |
PLASMA EMISSION MONITOR AND PROCESS GAS DELIVERY SYSTEM |
| 摘要 |
A gas manifold for delivery gas to a sputtering chamber is provided with ports (116) to accommodate plasma emission monitors to monitor plasma information in the sputtering chamber to provide feedback control. The collimators of the plasma emission monitors is exposed to gas flow and thus coating of the monitor is greatly reduced. |
| 申请公布号 |
WO2014149919(A1) |
申请公布日期 |
2014.09.25 |
| 申请号 |
WO2014US21516 |
申请日期 |
2014.03.07 |
| 申请人 |
CARDINAL CG COMPANY |
发明人 |
BURROWS, KEITH J.;GRUBER, CHRISTOPHER L.;HARTIG, KLAUS H.W. |
| 分类号 |
C23C14/34;C23C14/00;C23C14/54;H01J37/34 |
主分类号 |
C23C14/34 |
| 代理机构 |
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