Solid-state imaging device and method of controlling the same

摘要

According to one embodiment, a solid-state imaging device includes a semiconductor region, a first diffusion layer, a second diffusion layer, a third diffusion layer, an insulating film, a potential layer, and a read electrode. The semiconductor region includes first and second surfaces. The first diffusion layer is formed in the first surface. The first diffusion layer's concentration is a maximum value in a position at a first depth. The charge accumulation layer has a second depth. The second diffusion layer contacts the first diffusion layer. The third diffusion layer is formed in a position which faces the second diffusion layer in respect to the first diffusion layer. The insulating film is formed on the first surface. The potential layer is formed on the insulating film and has a predetermined potential. The read electrode is formed on the insulating film.

主权项

1. A solid-state imaging device comprising:
a semiconductor region with a first conductivity type or a second conductivity type, the semiconductor region including a first surface and a second surface facing the first surface; a first diffusion layer formed in the first surface of the semiconductor region, the first diffusion layer being second conductivity type, the first diffusion layer being doped such that a concentration becomes a maximum value in a position at a first depth from the first surface of the semiconductor region, a charge accumulation layer of the first conductivity type having a second depth smaller than the first depth from an interface between the first surface of the semiconductor region and a surface of the first diffusion layer being formed when an electron produced in the semiconductor region by light irradiated toward the second surface from the first surface of the semiconductor region is accumulated in the first diffusion layer which functions as a charge accumulation portion; a second diffusion layer with the first conductivity type, at least a portion of the second diffusion layer contacting the first diffusion layer; a third diffusion layer with the second conductivity type formed in the first surface of the semiconductor region, the third diffusion layer being formed in a position which faces the second diffusion layer in respect to the first diffusion layer; an insulating film formed on the first surface of the semiconductor region; a potential layer formed on the insulating film corresponding to the first diffusion layer, the potential layer having a predetermined potential; and a read electrode formed on the insulating film in a position between the first diffusion layer and the third diffusion layer, wherein a negative voltage is applied to the potential layer during a period in which electrons generated in the semiconductor substrate by receiving light accumulate in the diffusion layer, and the negative voltage is not applied to the potential layer during reading the electrons accumulated in the diffusion layer.