发明名称 Plasma generating apparatus
摘要 The plasma generating apparatus includes: an antenna chamber which is disposed adjacently to a plasma chamber that produces a plasma, and which is exhausted to vacuum; an antenna which is disposed in the antenna chamber, and which radiates a high-frequency wave; a partition plate which is made of an insulator, which separates the plasma chamber from the antenna chamber to block a gas from entering the antenna chamber, and which allows the high-frequency wave radiated from the antenna to pass through the partition plate; and a magnet device which is disposed outside the plasma chamber, and which generates a magnetic field for causing electron cyclotron resonance in the plasma chamber.
申请公布号 US8840844(B2) 申请公布日期 2014.09.23
申请号 US200912562880 申请日期 2009.09.18
申请人 Nissin Ion Equipment Co., Ltd. 发明人 Fujita Hideki;Shinohara Kibatsu
分类号 H01J37/32;H01J37/317;H01J37/02 主分类号 H01J37/32
代理机构 Osha Liang LLP 代理人 Osha Liang LLP
主权项 1. A plasma generating apparatus for generating and emitting plasma to an outside of the plasma generating apparatus, comprising: a plasma chamber exhausted to vacuum and into which gas and a high-frequency wave are introduced; an exit electrode disposed on one side of said plasma chamber and that includes one or more holes through which the plasma passes; an antenna chamber disposed adjacently to said plasma chamber and exhausted to vacuum; an antenna disposed in said antenna chamber and that radiates the high-frequency wave; a partition plate made of an insulating material, that separates said plasma chamber from said antenna chamber to block the gas from entering said antenna chamber, and that allows the high-frequency wave radiated from said antenna to enter said plasma chamber; and a magnet device disposed outside said plasma chamber, and that generates, in said plasma chamber, a magnetic field that causes electron cyclotron resonance in a direction intersecting with a direction along which the plasma is emitted from said exit electrode, wherein the exit electrode includes: a first exit electrode that includes a plurality of holes;a second exit electrode disposed downstream from the first exit electrode in the emission direction of the plasma and that includes a plurality of holes at positions corresponding to the plurality of holes of the first exit electrode; anda partition wall disposed between the first exit electrode and the second exit electrode to separate adjacent holes of the first exit electrodes from each other and separate adjacent holes of the second exit electrode from each other,wherein a plasma electrode has a plurality of holes and is disposed in a side of the plasma of the first electrode, andwherein the first exit electrode, the second exit electrode, the plasma electrode, and the plasma chamber are set to the same electric potential.
地址 Kyoto JP