发明名称 |
A SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME |
摘要 |
A semiconductor device includes a substrate, and a gate stack having at least one gate vertex directed to an area in the substrate below the gate stack. The semiconductor device also includes a source structure having at least one vertex directed toward the area in the substrate and a drain structure having at least one vertex directed toward the area in the substrate. |
申请公布号 |
KR20140112355(A) |
申请公布日期 |
2014.09.23 |
申请号 |
KR20130102973 |
申请日期 |
2013.08.29 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHENG. YU HUNG;TSAI CHING WEI;HSIEH WEN HSING;WU CHENG TA;TU YEUR LUEN |
分类号 |
H01L21/336;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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