发明名称 A SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
摘要 A semiconductor device includes a substrate, and a gate stack having at least one gate vertex directed to an area in the substrate below the gate stack. The semiconductor device also includes a source structure having at least one vertex directed toward the area in the substrate and a drain structure having at least one vertex directed toward the area in the substrate.
申请公布号 KR20140112355(A) 申请公布日期 2014.09.23
申请号 KR20130102973 申请日期 2013.08.29
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHENG. YU HUNG;TSAI CHING WEI;HSIEH WEN HSING;WU CHENG TA;TU YEUR LUEN
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
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