发明名称 THIN FILM TRANSISTOR AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor which can reduce a driving voltage.SOLUTION: A thin film transistor 10 comprises a silicon substrate 1, a channel layer 2, a source electrode 3, a drain electrode 4, an insulation film 5 and a gate electrode 6. The channel layer 2, the source electrode 3 and the drain electrode 4 are linearly arranged on the raised portions of an uneven shape of the silicon substrate 1 along a lengthwise direction of the raised portions. The channel layer 2 is composed of a carbon nanowall thin film. The source electrode 3 and the drain electrode 4 are composed of metal carbon nanowall thin films. The insulation film 5 is composed of SiOand arranged in contact with a rear face of the silicon substrate 1. The gate electrode 6 is composed of a lamination structure of Ti/Au and arranged in contact with the insulation film 5.
申请公布号 JP2014175418(A) 申请公布日期 2014.09.22
申请号 JP20130045952 申请日期 2013.03.07
申请人 CHUBE UNIV;HOKKAIDO UNIV;OSAKA UNIV;NISSIN ELECTRIC CO LTD 发明人 KAWAHARA TOSHIO;OKAMOTO KAZUMASA;MATSUMOTO KAZUHIKO;UTSUNOMIYA RISA;MATSUBA TERUAKI;MATSUMOTO HITOSHI
分类号 H01L29/786;H01L21/205;H01L21/336;H01L29/78;H01L51/05;H01L51/30;H01L51/40 主分类号 H01L29/786
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