发明名称 |
THIN FILM TRANSISTOR AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin film transistor which can reduce a driving voltage.SOLUTION: A thin film transistor 10 comprises a silicon substrate 1, a channel layer 2, a source electrode 3, a drain electrode 4, an insulation film 5 and a gate electrode 6. The channel layer 2, the source electrode 3 and the drain electrode 4 are linearly arranged on the raised portions of an uneven shape of the silicon substrate 1 along a lengthwise direction of the raised portions. The channel layer 2 is composed of a carbon nanowall thin film. The source electrode 3 and the drain electrode 4 are composed of metal carbon nanowall thin films. The insulation film 5 is composed of SiOand arranged in contact with a rear face of the silicon substrate 1. The gate electrode 6 is composed of a lamination structure of Ti/Au and arranged in contact with the insulation film 5. |
申请公布号 |
JP2014175418(A) |
申请公布日期 |
2014.09.22 |
申请号 |
JP20130045952 |
申请日期 |
2013.03.07 |
申请人 |
CHUBE UNIV;HOKKAIDO UNIV;OSAKA UNIV;NISSIN ELECTRIC CO LTD |
发明人 |
KAWAHARA TOSHIO;OKAMOTO KAZUMASA;MATSUMOTO KAZUHIKO;UTSUNOMIYA RISA;MATSUBA TERUAKI;MATSUMOTO HITOSHI |
分类号 |
H01L29/786;H01L21/205;H01L21/336;H01L29/78;H01L51/05;H01L51/30;H01L51/40 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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