| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique for minimizing reduction in drawing accuracy due to contamination of an aperture.SOLUTION: A charged particle beam drawing apparatus includes a beam emission part for emitting a charged particle beam, an aperture having an opening 26a through which a charged particle beam, emitted from the beam emission part, passes, an aperture beam tube 33c provided on the surface of the aperture, and functioning as a heat conduction member having thermal conductivity, and a heater 33d provided on the surface of the aperture beam tube 33c, and supplying heat to the aperture through the aperture beam tube 33c. |
