| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state imaging device having high stability and high sensitivity, and a method of manufacturing the same.SOLUTION: According to an embodiment, there is provided the solid-state imaging device including a silicon substrate, a color filter layer, and first to third optical layers. The silicon substrate includes a plurality of imaging units. The color filter layer is separated from the silicon substrate and has a refractive index lower than that of the silicon substrate. The first optical layer is provided between the silicon substrate and the color filter layer, has a first refractive index lower than those of the color filter layer and the silicon substrate, and is light-transmissive. The second optical layer is provided between the first optical layer and the color filter layer, has a second refractive index higher than the first refractive index and lower than that of the silicon substrate, and is light-transmissive and polycrystalline. The third optical layer is provided between the second optical layer and the color filter layer, has a third refractive index lower than that of the color filter layer and the second refractive index, and is light-transmissive. |
