LIGHT IRRADIANCE AND THERMAL MEASUREMENT IN UV AND CVD CHAMBERS

摘要

Embodiments of a semiconductor processing chamber described herein include a substrate support, a source of radiant energy opposite the substrate support, a window between the source of radiant energy and the substrate support, a detector sensitive to the radiant energy positioned to detect the radiant energy transmitted by the window, and a detector sensitive to radiation emitted by the substrate positioned to detect radiation emitted by the substrate. The chamber may also include a showerhead. The substrate support may be between the detectors and the window. A second radiant energy source may be included to project energy through the window to a detector. The second radiant energy source may also be located proximate the first radiant energy source and the detectors.

主权项

1. A semiconductor processing chamber, comprising:
a substrate support; a source of radiant energy opposite the substrate support; a window between the source of radiant energy and the substrate support; a detector sensitive to the radiant energy positioned to detect the radiant energy transmitted by the window; and a detector sensitive to radiation emitted by the substrate positioned to detect radiation emitted by the substrate.