| 摘要 |
<p>An illumination optical unit (4) for projection lithography serves to illuminate an object field (5), in which an object (7) to be imaged can be arranged, with illumination light (16). The illumination optical unit (4) comprises a field facet mirror (19) with a plurality of field facets (20). Furthermore, the illumination optical unit (4) comprises a pupil facet mirror (25) with a plurality of pupil facets. The field facets (20) are imaged in the object field (5) by a transfer optical unit (21, 25, 39). The at least one pupil facet mirror (25) has at least one pupil facet mirror polarization section (29, 30) and at least one pupil facet mirror neutral section (34). The polarization section (29, 30) is arranged in such a way that the illumination light is reflected in the region of a Brewster angle. The neutral section (34) is arranged in such a way that the illumination light (16) is reflected in the region of a normal incidence. What emerges is an illumination optical unit, in which the illumination of the object to be imaged can be designed in a flexible manner and can be adapted well to predetermined values.</p> |
