发明名称 |
Vertical Hall Effect Element With Structures to Improve Sensitivity |
摘要 |
A vertical Hall Effect element includes one or more of: a low voltage P-well region disposed at a position between pickups of the vertical Hall Effect element, Light-N regions disposed under the pickups, a pre-epi implant region, or two epi regions to result in an improved sensitivity of the vertical Hall Effect element. A method results in the vertical Hall Effect element having the improved sensitivity. |
申请公布号 |
US2014264667(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201313836869 |
申请日期 |
2013.03.15 |
申请人 |
Wang Yigong;Cooper Richard B. |
发明人 |
Wang Yigong;Cooper Richard B. |
分类号 |
H01L43/06;H01L43/14 |
主分类号 |
H01L43/06 |
代理机构 |
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代理人 |
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主权项 |
1. A Hall Effect element disposed over a substrate, the Hall Effect element comprising:
an N-type epitaxial layer disposed over the substrate; a plurality of pickups implanted and diffused into the epitaxial layer, adjacent pairs of the plurality of pickups separated by separation regions, each one of the plurality of pickups comprising a respective N-plus type diffusion; and a plurality of Light-N regions implanted and diffused into the epitaxial layer, each one of the plurality of Light-N regions disposed under a respective one of the plurality of pickups, wherein the Hall Effect element is configured to generate a Hall voltage between at least one pair of the plurality of pickups, wherein the Hall voltage is most responsive to a magnetic field directed parallel to a major surface of the substrate. |
地址 |
Rutland MA US |