| 摘要 |
The present invention provides a photo-curable composition having high resistance, excellent sensitivity, and heat resistance and enabling production of an appropriate pattern shape or minute patterns. The photo-curable composition comprises (A) a photopolymerizable unsaturated compound having a structure of the reaction product of an esterification reaction between an epoxy addition compound, which has a structure obtained by adding an unsaturated monobasic acid in an epoxy compound represented by the following formula (I), and a polybasic anhydride; (B) a polyfunctional thiol compound; (C) a photo-polymerization initiator; and (D) a coloring agent. (Refer to the specification for the definition of R^1, R^2, R^3, R^4, Y, Z, m, p, q, r, and s in formula (I).). |
