PELLICLES WITH REDUCED PARTICULATES

摘要

Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask.

主权项

1. A pellicle frame comprising:
a side member having a recess formed in a first surface thereof, the recess forming a closed path in the first surface; a locking member dimensioned to secure a membrane to the pellicle frame when a portion of the membrane is disposed between the recess and the locking member; and a non-adhesive attachment member to secure the side member to a photomask.