| 摘要 |
An exposure apparatus is equipped with a table which holds a wafer and is movable along an XY plane and has a grating provided on its rear surface, an encoder which irradiates a first measurement beam on the grating from below, receives a return light, and measures a first position information of the table when the table moves in a predetermined range, and another encoder which has a head section provided in a frame and irradiates a second measurement beam on a different grating on the table from the head section, receives a return light, and can measure a second position information of the table, concurrently with measurement of the first position information by the encoder when the table moves in predetermined range. A controller drives the table, based on position information having a higher reliability of the first and the second position information. |
