发明名称 Automated inline defect characterization
摘要 Defect characterization is a useful tool for analyzing and improving fabrication for semiconductor chips. By using layout and netlist in combination with images of semiconductors, defects can be identified and analyzed. Electrical simulation can be performed on the netlist, based on the presence of the defect that was detected. Layout geometries where the defect was detected can be binned and a search can be performed of the remainder of the layout for similar groupings of layout geometries. Various representations of the semiconductor can be cross mapped, including layout, schematic, and netlist. The presence of certain defects can be correlated to yield, performance, and other characteristics.
申请公布号 US8826209(B2) 申请公布日期 2014.09.02
申请号 US201213539249 申请日期 2012.06.29
申请人 Synopsys, Inc. 发明人 Kramer James Robert;Oberai Ankush
分类号 G06F17/50 主分类号 G06F17/50
代理机构 Adams Intellex, PLC 代理人 Adams Intellex, PLC
主权项 1. A computer implemented method for performing defect characterization comprising: importing a layout for a semiconductor circuit; importing a netlist for the semiconductor circuit; obtaining images of a semiconductor chip which comprises the semiconductor circuit during fabrication; detecting, using one or more processors, a defect in one of the images of the semiconductor chip wherein the defect is at a location on a portion of the semiconductor chip that is represented by the layout and wherein the detecting is based on determining a critical volume; and performing an electrical analysis of the netlist with the detected defect.
地址 Mountain View CA US