| 摘要 |
The present invention relates to an alkali soluble resin and a photosensitive resin composition and, more specifically, to an alkali soluble resin and a photosensitive resin composition including essentially of a compound represented by the following formula 1, having good heat resistance, good residue properties, residual layer ratio, chemical resistance and mechanical properties, and usefully applicable in a photo curable ink, a photosensitive printed board, various photoresists, a color filter for an LCD, a photoresist for resin black matrix or a transparent photosensitive material. [Formula 1] In the above formula 1, R1 is hydrogen or an alkyl group having 1-6 carbon atoms, R2 is an alkyl group, an alkenyl group, or an aryl group having 1-20 carbon atoms, R3 and R4 are independently an alkyl group, an alkenyl group, or an aryl group having 1 to 12 carbon atoms, A1 is a divalent connecting group and an alkyl group or an alkynyl group having 1-4 carbon atoms, and X is carboxylate (-COO^-), sulfonate (SO_3^-) or sulfate (-OSO_3^-). |
