| 发明名称 |
ALUMINUM PRECURSOR, METHOD OF FORMING A THIN FILM AND METHOD OF FORMING A CAPACITOR USING THE SAME |
| 摘要 |
An aluminum compound is represented by following Formula 1. In Formula 1, X is a functional group represented by following Formula 2 or Formula 3.; |
| 申请公布号 |
US2014242263(A1) |
申请公布日期 |
2014.08.28 |
| 申请号 |
US201414176173 |
申请日期 |
2014.02.10 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOUN Sang-Chul;SAKURAI Atsushi;HATASE Masako;CHO Youn-Joung;KANG Ji-Na;YAMADA Naoki;CHOI Jung-Sik |
| 分类号 |
H01G13/00 |
主分类号 |
H01G13/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An aluminum compound represented by the following Formula 1, wherein X is a functional group represented by the following Formula 2 or Formula 3: |
| 地址 |
Suwon-si KR |
