| 摘要 |
PROBLEM TO BE SOLVED: To uniformly bring a projection mask into close contact with a substrate by bending an exposure table and a mask plate in such a manner that they substantially coincide with irregularities on the substrate.SOLUTION: An exposure device comprises: an exposure table on which a substrate is placed; a mask plate which holds a projection mask arranged to face the substrate; a table frame which supports the exposure table; a ring-shaped seal portion which is arranged on a top face of a peripheral part of the table frame so as to form a sealed part between the table frame and the mask plate; a ring-shaped outer tube having fluid inside which supports the exposure table in the vicinity of the peripheral part of the table frame; a ring-shaped inner tube having fluid inside which supports the exposure table in an inner region of the table frame and forms, together with the ring-shaped outer tube, a plurality of spaces between the table frame and the exposure table; vacuum pressure adjustment means which individually adjusts vacuum pressures in the sealed part and the spaces; and fluid pressure adjustment means connected to the ring-shaped outer tube and the ring-shaped inner tube so as to individually adjust internal fluid pressures. |
