发明名称 MANUFACTURING METHOD OF TRANSPARENT CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a transparent conductive film having a transparent conductive membrane having low specific resistance value and surface resistance value and made of a thin crystalline film, on an organic polymeric film substrate.SOLUTION: A manufacturing method of a transparent conductive film includes: a process (A) of producing a transparent conductive membrane 2 at least on one surface of an organic polymeric film substrate 1, by an RF superposition DC sputter deposition method, employing a roll-to-roll apparatus, using a target of an indium-based complex oxide in which a proportion of tetravalent metal element oxide expressed by {tetravalent metal element oxide/(tetravalent metal element oxide+indium oxide)}×100(%) is 7-15 wt.%, at a high magnetic field having a horizontal magnetic field of 85-200 mT on a surface of the target, under a presence of inert gas. The transparent conductive membrane is a crystalline membrane of the indium-based complex oxide. In the transparent conductive membrane, film thickness is within a range from 10 nm to 40 nm, and a specific resistance value is from 1.3×10to 2.8×10&OHgr; cm.
申请公布号 JP2014157816(A) 申请公布日期 2014.08.28
申请号 JP20140003950 申请日期 2014.01.14
申请人 NITTO DENKO CORP 发明人 SASA KAZUAKI;YAMAMOTO YUSUKE;MACHINAGA HIRONOBU
分类号 H01B13/00;B32B7/02;B32B9/00;B32B27/00;C23C14/08;C23C14/34;C23C14/35 主分类号 H01B13/00
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