| 发明名称 |
CERAMIC SHOWERHEAD WITH EMBEDDED RF ELECTRODE FOR CAPACITIVELY COUPLED PLASMA REACTOR |
| 摘要 |
A showerhead assembly for a substrate processing system includes a back plate connected to a gas channel. A face plate is connected adjacent to a first surface of the back plate and includes a gas diffusion surface. An electrode is arranged in one of the back plate and the face plate and is connected to one or more conductors. A gas plenum is defined between the back plate and the face plate and is in fluid communication with the gas channel. The back plate and the face plate are made of a non-metallic material. |
| 申请公布号 |
US2014238608(A1) |
申请公布日期 |
2014.08.28 |
| 申请号 |
US201313858477 |
申请日期 |
2013.04.08 |
| 申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
Sabri Mohamed;Augustyniak Edward;Keil Douglas L.;Lingampalli Ramkishan Rao;Leeser Karl;Barnett Cody |
| 分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A showerhead assembly for a substrate processing system, comprising:
a back plate connected to a gas channel; a face plate connected adjacent to a first surface of the back plate and including a gas diffusion surface; one or more conductors; and an electrode arranged in one of the back plate and the face plate and connected to the one or more conductors, wherein a gas plenum is defined between the back plate and the face plate and is in fluid communication with the gas channel, and wherein the back plate and the face plate are made of a non-metallic material. |
| 地址 |
San Jose CA US |
