| 摘要 |
A first light source unit (331) that irradiates one pattern-formed circumferential surface (91) of a transparent base material (9) with light; a second light source unit (332) that irradiates the other circumferential surface (92) with light; and a single light receiving unit (341) that is capable of receiving reflected light from the pattern of the light from the first light source unit (331) and transmitted light from the transparent base material (9) of the light from the second light source unit (332) are disposed in a pattern inspection apparatus. When the first light source unit (331) and the second light source unit (332) are alternately lighted while the transparent base material (9) is continuously moved, a reflection image based on the reflected light from the pattern and a transmission image based on the transmitted light from the transparent base material (9) can be acquired by using the single light receiving unit (341). Accordingly, the number of components of the pattern inspection apparatus can be reduced. |
