| 发明名称 |
LITHOGRAPHY ORIGINAL CHECKING DEVICE, LITHOGRAPHY ORIGINAL CHECKING METHOD, AND PATTERN DATA CREATING METHOD |
| 摘要 |
In one embodiment, a lithography original checking method includes applying resin onto a first lithography original having a first concavo-convex pattern, hardening the resin, releasing the hardened resin from the first lithography original and producing a second lithography original having a second concavo-convex pattern corresponding to the first concavo-convex pattern, enlarging the second lithography original, detecting a defect on the enlarged second lithography original, and calculating a position of a defect on the first lithography original based on the position of the detected defect. |
| 申请公布号 |
US2014232032(A1) |
申请公布日期 |
2014.08.21 |
| 申请号 |
US201314018013 |
申请日期 |
2013.09.04 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
Yoshikawa Ryoji;Kawamura Daisuke;Morita Seiji;Higashiki Tatsuhiko;Hirano Takashi |
| 分类号 |
G01N21/956;G01N1/28 |
主分类号 |
G01N21/956 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithography original checking method comprising:
applying resin onto a first lithography original having a first concavo-convex pattern; hardening the resin; releasing the hardened resin from the first lithography original and producing a second lithography original having a second concavo-convex pattern corresponding to the first concavo-convex pattern; enlarging the second lithography original; detecting a defect on the enlarged second lithography original; and calculating a position of a defect on the first lithography original based on the position of the detected defect. |
| 地址 |
Tokyo JP |
