发明名称 GAS FIELD IONIZATION ION SOURCE AND SCANNING ION MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide a scanning ion microscope in which an ion beam current is stable for a long term.SOLUTION: In a gas field ionization ion source and a scanning ion microscope using the same, a structure which is controlled so as to have a relatively low temperature with respect to an emitter electrode is provided in a space having the same gas pressure as the gas pressure in the vicinity of the emitter electrode. Preferably, the temperature is controlled to be equal to or less than 60 K. With the operation time of a device or instability of an ion beam current as a determination reference, the operation of the ion source is stopped and the control to increase the temperature of the structure for a predetermined time and by a predetermined temperature difference is performed. Consequently, the ion beam current becomes stable for a long term, a sample image is suppressed from having extra noise, and the accuracy of quantitative measurement, processing and analysis is improved. Moreover, since the breakage of the emitter electrode can be prevented in advance, restoration (recovery or replacement) work is reduced and the operation rate of the device is improved.
申请公布号 JP2014149920(A) 申请公布日期 2014.08.21
申请号 JP20130016324 申请日期 2013.01.31
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KAWANAMI YOSHIMI;MUTO HIROYUKI
分类号 H01J27/26;H01J37/08;H01J37/28 主分类号 H01J27/26
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