发明名称 POLYMER PRODUCTION METHOD, POLYMER FOR USE IN LITHOGRAPHY, RESIST COMPOSITION AND SUBSTRATE PRODUCTION METHOD
摘要 <p>A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.</p>
申请公布号 KR101432395(B1) 申请公布日期 2014.08.20
申请号 KR20127000221 申请日期 2010.07.07
申请人 发明人
分类号 C08F2/00;C08F220/10;C08L33/04;G03F7/26 主分类号 C08F2/00
代理机构 代理人
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