发明名称 Method for surface treatment of copper and copper
摘要 An object of the present invention is to provide a copper surface treatment method capable of keeping certainly a bonding strength between a copper surface and a resist, or between a copper surface and an insulating resin without forming irregularities having sizes of more than 1 μm on the copper surface, and a copper treated with the method. The surface treatment method, comprising: a first step of forming, on a copper surface, a nobler metal than the copper discretely; a second step, subsequent to the first step, of forming copper oxide on the copper surface by oxidation with an alkaline solution containing an oxidizing agent; and third step of dissolving the copper oxide so as to be removed, thereby forming irregularities on the copper surface.
申请公布号 US8809696(B2) 申请公布日期 2014.08.19
申请号 US200913060095 申请日期 2009.06.17
申请人 Hitachi Chemical Company, Ltd. 发明人 Yamashita Tomoaki;Nakajima Sumiko;Itou Sadao;Inoue Fumio;Arike Shigeharu
分类号 H05K1/00 主分类号 H05K1/00
代理机构 Antonelli, Terry, Stout & Kraus, LLP. 代理人 Antonelli, Terry, Stout & Kraus, LLP.
主权项 1. A copper surface treatment method, comprising: a first step of forming, on a copper surface, a nobler metal than the copper discretely, a second step, subsequent to the first step, of forming copper oxide on the copper surface by oxidation with an alkaline solution containing an oxidizing agent, a next third step of dissolving the copper oxide so as to be removed, thereby forming irregularities on the copper surface, and a fourth step of subjecting the copper surface to a treatment for improving the bonding strength thereof after the third step, wherein the fourth step includes at least one treatment selected from the group consisting of a treatment for forming a baser metal than copper onto the copper surface and a treatment with a solution containing an azole compound.
地址 Tokyo JP