发明名称 PATTERN FORMATION DEVICE AND PATTERN FORMATION METHOD
摘要 <p>PROBLEM TO BE SOLVED: To stabilize the image drawing quality by homogenizing, in a high precision, the intensity distribution of optical beams irradiated from an optical beam irradiator regardless of drive periods of mirrors of a digital micromirror device (DMD).SOLUTION: An operative mirror gap determination unit (79) determines the gap of operated mirrors of a spatial optical modulator of an optical beam irradiator. A mirror block determination unit (80) divides the respective mirrors into blocks specific to gaps of the operated mirrors. A drive limit occasion count determination unit (82) determines the numbers of occasions for limiting the drives of mirrors within individual inspection regions depending on optical beam intensities within the respective inspection regions. A correction data creation unit (84) creates correction data for limiting the drives of mirrors by the block unit within the respective inspection regions over the number of occasions determined by the drive limit occasion count determination unit (82). An image drawing control unit (71) corrects image drawing data by using the created correction data and feeds the corrected image drawing data into the drive circuit of the optical beam irradiator.</p>
申请公布号 JP2014146013(A) 申请公布日期 2014.08.14
申请号 JP20130016213 申请日期 2013.01.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 UEHARA SATOSHI;KUDO SHINYA
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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