INJECTION MEMBER IN FABRICATION OF SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

摘要

Provided is a substrate processing apparatus which include a process chamber in which a plurality of substrates are accommodated to be processed, a support member mounted at the process chamber and having the same plane on which a plurality of substrate are placed, an injection member mounted opposite to the support member and including a plurality of independent baffles to independently inject the least one reactive gas and the purge gas at positions respectively corresponding to the plurality of substrates placed on the support member, and a driving unit adapted to rotate the support member or the injection member such that the baffles of the injection member sequentially revolve around the plurality of respective substrates. The injection member includes a plasma generator mounted at least one of the baffles to plasmatize a reactive gas injected to a substrate.

主权项

1. An injection member for use in a substrate processing apparatus, comprising:
a disk-shaped top plate; at least four baffles demarcated by partitions radially mounted on a bottom surface of the top plate; and side nozzle unit mounted at the partitions in a length direction to inject a gas to each of the at least four baffles.