发明名称 |
Through-substrate vias and methods for forming the same |
摘要 |
A device includes a semiconductor substrate and a Metal-Oxide-Semiconductor (MOS) transistor. The MOS transistor includes a gate electrode over the semiconductor substrate, and a source/drain region on a side of the gate electrode. A source/drain contact plug includes a lower portion and an upper portion over the lower portion, wherein the source/drain contact plug is disposed over and electrically connected to the source/drain region. A gate contact plug is disposed over and electrically connected to the gate electrode, wherein a top surface of the gate contact plug is level with a top surface of the top portion of the source/drain contact plug. A Through-Substrate Via (TSV) extends into the semiconductor substrate. A top surface of the TSV is substantially level with an interface between the gate contact plug and the gate electrode. |
申请公布号 |
US8803292(B2) |
申请公布日期 |
2014.08.12 |
申请号 |
US201213457823 |
申请日期 |
2012.04.27 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Chen Ming-Fa;Wang Yu-Young;Jan Sen-Bor |
分类号 |
H01L29/40 |
主分类号 |
H01L29/40 |
代理机构 |
Slater and Matsil, L.L.P. |
代理人 |
Slater and Matsil, L.L.P. |
主权项 |
1. A device comprising:
a semiconductor substrate; a Metal-Oxide-Semiconductor (MOS) transistor comprising:
a gate electrode over the semiconductor substrate; anda source/drain region on a side of the gate electrode; a source/drain contact plug comprising a lower portion and an upper portion over the lower portion, wherein the source/drain contact plug is over and electrically connected to the source/drain region; a gate contact plug over and electrically connected to the gate electrode, wherein a top surface of the gate contact plug is level with a top surface of the upper portion of the source/drain contact plug; and a Through-Substrate Via (TSV) extending into the semiconductor substrate, wherein a top surface of the TSV is level with an interface between the gate contact plug and the gate electrode. |
地址 |
Hsin-Chu TW |